ISO 14606:2022

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.

This document is not intended to cover the use of special multilayered systems such as delta doped layers.

Edition	2022
Published Date	2022
Published By	International Standardization Organisation
Page Count	17