ISO/ASTM 51818:2009
Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV
Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV
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Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV
Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV
ISO 51818:20090 applies to dosimetric procedures to determine the performance of low-energy (300 keV or less) single-gap electron-beam radiation processing facilities.
Other practices and procedures related to facility characterization, process qualification and routine processing are also discussed.
The electron-energy range covered in ISO 51538:2009 is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma-source accelerators.
| Edition | 2009 |
|---|---|
| Published Date | 2009 |
| Published By | ISO/ASTM |
| Page Count | 11 |