ISO/TR 15969:2001

Surface chemical analysis — Depth profiling — Measurement of sputtered depth

This Technical Report gives guidelines for measuring the sputtered depth in sputtered depth profiling. The methods

of sputtered depth measurement described in this Technical Report are applicable to techniques of surface

chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a

typical sputtered depth of up to severalmicrometres.

Edition	2001
Published Date	2001
Published By	International Standardization Organisation/Technical Reference
Page Count	12